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Thin film coating services apply very thin layers of specialized materials to part surfaces. They perform processes such chemical vapor deposition (CVD), physical vapor deposition (PVD), ion implantation, electrochemical deposition (ECD), plasma etching, rapid thermal processing (RTP), and titanium nitride coating. Search by Specification | Learn More
Specialty coating machines and applicators includes unlisted, patented, proprietary or other highly specialized equipment or components for applying coatings. Learn More
Electrochemical, photochemical and chemical milling services use etching, electrochemical, and photochemical processes to create unstressed, high-precision parts. Search by Specification | Learn More
...and then sprayed toward a part with an opposite and attractive electric charge. ECD coating equipment uses processes such as electrochemical deposition, liquid-phase epitaxy, electroless plating, electroplating, and electrophoretic deposition. Coating... Search by Specification | Learn More
Corrosion and electrochemical instruments use a variety of methods to detect and measure corrosion and electrochemical conditions in plant machinery, field equipment, batteries, fuel cells, colloids, and other solutions or systems Search by Specification | Learn More
Thin film equipment uses vacuum processing for the modification of surfaces using CVD, PVD, plasma etching, and thermal oxidation or ion implantation. Thin film equipment is vacuum process equipment for the deposition or modification of thin films... Search by Specification | Learn More
Examples of thin-film processes include chemical vapor deposition (CVD), electrochemical deposition (EVD), physical vapor deposition (PVD), ion implantation, plasma etching, and rapid thermal processing (RTP). Web coating services provide several types... Search by Specification | Learn More
...include brass, cadmium, chrome, copper, gold, nickel, platinum, rhodium, silver, tin, tin-lead, titanium, and zinc. Examples of thin-film processes include chemical vapor deposition (CVD), electrochemical deposition (EVD), physical vapor deposition (PVD... Search by Specification | Learn More
...lead, titanium, and zinc. Examples of thin-film processes include chemical vapor deposition (CVD), electrochemical deposition (EVD), physical vapor deposition (PVD), ion implantation, plasma etching, and rapid thermal processing (RTP). Resurfacing... Search by Specification | Learn More
Thin film sources consist of magnetrons, evaporation thermal units, ion beams and other sources that produce deposition materials (vapors or ions) in a thin film system. Learn More
Coating and spray booths are enclosures used to contain spray coating processes such as painting, powder coating, thermal spraying, and other deposition methods. This category includes hoods, cabinets, tunnels and similar enclosures Search by Specification | Learn More
...in manufacturing machinery, batteries and fuel cells, and field equipment. Corrosion is a chemical or electrochemical reaction between a metal and its environment. Corrosion probes, corrosion coupons and corrosion coupon holders are used in conjunction... Learn More
Instruments such as quartz crystal microbalance (QCM) monitors, ellipsometers, RHEED systems, imaging stations, CD-SEMs, ion mills, C-V systems specifically designed for wafer metrology or in-situ monitoring of thin film parameters during thin film or semiconductors wafer processing. Search by Specification | Learn More
...in fabrication and wafer processing equipment may repair, rebuild, and refurbish film coating, photo-optical, and wafer flat aligners; chemical vapor deposition (CVD) equipment for epitaxial silicon, silicide, or rapid thermal processing; crystal... Learn More
Gas detectors and gas sensors interact with a gas to initiate the measurement of its concentration. The detector or sensor then provides output to an instrument to display the measurements. Search by Specification | Learn More
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PECVD Silicon Carbide Thin Film for Silicon Wafers Rogue Valley Microdevices, Inc.
Low Stress LPCVD Nitride for Silicon Wafers Rogue Valley Microdevices, Inc.
Evaporated Metal Stacks-Cr/Au, Ti/Au, Ti/Pt, Cr/Pt Rogue Valley Microdevices, Inc.
Wet Thermal Oxidation - up to 15 um thick Rogue Valley Microdevices, Inc.
Dry Chlorinated Thermal Oxide- Available for MOS Rogue Valley Microdevices, Inc.
LPCVD Nitride - Stoichiometric 800 MPa Rogue Valley Microdevices, Inc.
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Conductive Technologies specializes in transforming sensor concepts into finished products that are reliable, easy-to-use and cost effective by drawing on its experiences in prototyping, developing and manufacturing electrochemical sensors for a number of applications. (read more)
Electrochemical sensors to measure specific gases in the ppm range, including hydrogen sulfide, sulfur dioxide, oxygen, and others (read more)
Electrochemical Analyzers for Toxic Gases in Air (read more)
With a breakthrough in electrochemical cell sensor technology, the new TS Series Hydrogen Sulfide Gas Detectors from General Monitors provide advanced protection against the deadly hazards of hydrogen sulfide gas (H2S) for a wide range of applications. (read more)
When quality counts, companies count on Mi-Tech Metals. Our tungsten composites are used worldwide for electrical discharge machining (EDM) and electrochemical machining (ECM) electrodes. (read more)
Net Safety's toxic gas detector, the Millennium, delivers safety, security and performance - protection you can trust! Using the latest in electrochemical sensor technology, the Millennium continuously monitors your site for a wide range of toxic gas types. The Millennium is fast and accurate and requires only periodic calibration and maintenance. (read more)
Our unique and highly developed metal deposition process, coined LAP™ (Laser Applied Powder), offers government and private industry first-time access to this extraordinary metal surface restoration technology. (read more)
Fairfield Crystal Technology's evaporation chemicals for optical coating are produced to a consistent high quality and purity. Our deposition materials are 99.999% pure. They evaporate cleanly and completely, without out-gassing or spitting and leave a hard, uniform coating on the substrate. (read more)
The Kaman SMU-9000-5U measuring system is a noncontact system that offers high resolution to one nanometer. It features repeatability and is available with a wide range of sensor options. (read more)
Export, PA, Summer 2009 – Oerlikon Leybold Vacuum USA has introduced the UNIVEX line of universal experimentation PVD vacuum coating systems for use in research & development and pilot production applications. (read more)
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Combinatorial electrochemical deposition system invention Combinatorial electrochemical deposition system -> Monitor Keywords Combinatorial electrochemical deposition system |
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Electrochemical deposition method utilizing microdroplets of... Only the targeted circuit element is electrically biased so that deposition occurs on the surface of that element, underneath the microdroplet, and |
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Semiconductor Manufacturing - Electrochemical Deposition Electrochemical Deposition Main Index > Film Deposition > Electrochemical Deposition |
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Templated Electrochemical Deposition of Nanostructured... Templated Electrochemical Deposition of Nanostructured Materials and their Applications See Storming Media LLC Information |
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2003 MRS Spring Meeting |
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Research Progress on Electrochemical Deposition in Electronic... Research Progress on Electrochemical Deposition in Electronic Packaging |
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Rapid Fabrication of CNT Sensors Using Electro-chemical... Systems Item Title: Rapid Fabrication of CNT Sensors Using Electro-chemical Deposition of Functionalized CNTs Publisher Name: IEEE Meeting Location: |
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Abstracts: Electrochemical metal deposition on top of an... Electrochemical metal deposition on top of an organic monolayer |
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Deposition of HgTe by electrochemical atomic layer epitaxy... Deposition of HgTe by electrochemical atomic layer epitaxy (EC-ALE) |
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Interplay between the deposition mode and microstructure in... Title: Interplay between the deposition mode and microstructure in electrochemically deposited Cu thin films Authors: K. Kremmer, O. Yezerska, G. |